Facilities At Nanoscale Energy & Surface Engineering Group
Magnetron sputtering
Magnetron sputtering is a deposition technology involving a gaseous plasma which is generated and confined to a space containing the material to be deposited – i.e., the ‘target’. Electrons which are present in the sputtering gas are accelerated away from the cathode causing collisions with nearby atoms of sputtering gas, resulting in the formation of thin films
We use magnetron sputtering to prepare oxide and nitride thin films
Plasma Research Facility
We have wide range of plasma equipment
- Atmospheric pressure plasma activated deposition
- Plasma etcher
- Plasma functionalisation
- Plasma diagnostics
X-ray photoelectron spectroscopy (XPS) with a load-locked KRATOS XSAM-800 instrument equipped with a dual anode X-ray source using a Mg Kα (1253.6 eV) excitation source operated at 12 kV and 10 mA.
The high magnification analyser mode was chosen to collect electrons from the smallest possible area on the specimen, ~ 4.0 mm2
General
A XPS is available for sample analysis. This instrument has both monochromatized and non-monochromatized X-ray sources and spatial imaging capabilities. It is also equipped with a vacuum ultraviolet light source for ultraviolet photoelectron spectroscopy (UPS), a resterable ion gun for sample cleaning, depth profiling and an electron gun for scanning Auger electron spectroscopy (AES), a sample holder with cooling, heating, and five degrees (X, Y, Z, tilt, azimuthal) of motion, a load-lock sample introduction and transferring system, a sample preparation chamber, and appropriate software.
This XPS instrument is available for analysis of samples from all members of the OU community as well as from outside users.
The instrument is located in Perry D building.
The facility is being operated by Dr Ajay Kumar Thakur, Lois Afua Damptey
Currently, all samples are to be analyzed by Dr. Ajay Kumar. Student training or access to the instrument is available at the present time.
Technical supervision is being provided by Prof. Satheesh Krishnamurthy
Services Offered
The capabilities of this instrument include:
Routine XPS analysis of samples. This includes wide scans and detailed analysis of specific elements. Binding energy resolution down to approximately 0.3 eV may be obtained by using the monochromatized X-ray source.
Depth profile and angle-resolved XPS studies to investigate the composition variations of the sample versus depth.
Spatially resolved XPS images, down to a few microns resolution. Individual spectra can be acquired on specific points of the sample.
UPS spectra using both He I (21.2 eV) and He II (40.8 eV) UV sources. Other wavelengths (using other rare gases) may be possible.
Scanning electron microscopy (SEM) imaging, down a few microns, and spatially resolved AES analysis using electron excitation.
Acknowledgements
This instrument was acquired with funds from the Open university Major Research Instrumentation Program equipment fund, Royal Academy of Engineering and Space Strategic Research Area of the open university and SRA IDI
NEW XPS Coming soon!!!
UHV XPS with UPS
Electrochemical workstation with rotating electrode
Solar Simulator for studying material properties
Battery tester
Battery tester configured with multi-current range channels, which have a current control range of 0.5mA to 0.1A, 0.1A to 3A, 3A to 6A as standard. The accuracy for current and voltage on these channels is ±0.05% FS. From the base system that provides the highest level of accuracy and time resolution, features can be added to allow the CT-4008-5V6A test system to perform virtualy many type of test, with many type of products( cylindrical, pouch and coin cells, super-capacitors, etc.) and chemistries.
Atomic Force Microscopy
The Asylum Research MFP3D-SA is a very versatile atomic force microscope, suitable for use with a wide range of samples and features a vast array of modes.
It has a z-range of 40 um (extended head model) and an x and y movement of up to 90 um in a closed loop scan. The microscope differs from most others available on the market due to using seperate piezos for each plane. This allows for the use of nano-position sensors, minimising hysterisis and creep, whilst also ensuring flat scans.
The MFP-3D is able to image conductive, semiconductive and insulating samples in both air and liquid environments. The head can be adjusted to fit a wide range of sample sizes and both top down and bottom up illumination of samples is possible.
MFP3D also hosts conducting AFM tips with spatial resolution.
Images from our group
